Manganese electrodeposition from urea-rich electrolyte

Mladen Vuruna, Mihael M Bučko, Ljubica Radović, Jelena B Bajat


Pure manganese coatings were prepared on the steel (AISI 4340) electrode by non-conventional electrodeposition method, in the presence of 8 mol dm-3 of urea as a plating additive. The influence of urea on the electrodeposition of Mn was investigated by linear sweep voltammetry. The morphology of the coatings was studied by scanning electron microscopy (SEM), and their elemental composition by energy dispersive X-ray spectrometry (EDS). The results showed that the presence of urea in the solution enhanced both the reduction of water and Mn2+ ions, however it also increased the current efficiency for metal reduction for around 20 %. Moreover, urea improves the characteristics of Mn deposits, i.e. their adhesiveness, porosity, compactness, and appearance. Except from oxygen as a part of Mn corrosion product at the coatings' surface, no carbon or nitrogen incorporation was detected in the deposits by EDS.


urea; electrodeposition; Mn coating; morphology

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P. Díaz-Arista, G. Trejo, Electrodeposition and characterization of manganese coatings obtained from an acidic chloride bath containing ammonium thiocyanate as an additive, Surf. Coat. Technol., 201, 3359–3367 (2006).

A. R. Grayeli-Korpi, H. Savaloni, M. Habibib, Corrosion inhibition of stainless steel type AISI 304 by Mn coating and subsequent annealing with flow of nitrogen at different temperatures, Appl. Surf. Sci., 276, 269–275 (2013).

R. Pinto, M.J. Carmezim, M.F. Montemor, Electrodeposition and isothermal aging of Co and Mn layers on stainless steel for interconnectors: Initial stages of spinel phase formation, J. Power Sources, 255, 251–259 (2014).

A. Sulcius, E. Griskonis, K. Kantminiene, N. Zmuidzinaviciene, Influence of different electrolysis parameters on electrodeposition of γ- and α-Mn from pure electrolytes – a review with special reference to Russian language literature, Hydrometallurgy, 137, 33–37 (2013).

Y. Sun, X. Tian, B. He, C. Yang, Z. Pi, Y. Wang, S. Zhang, Studies of the reduction mechanism of selenium dioxide and its impact on the microstructure of manganese electrodeposit, Electrochim. Acta, 56, 8305–8310 (2011).

J. Lu, D. Dreisinger, T. Glück, Manganese electrodeposition – A literature review, Hydrometallurgy, 141, 105–116 (2014).

Q. Wei, X. Ren, J. Du, S. Wei, S. Hu, Study of the electrodeposition conditions of metallic manganese in an electrolytic membrane reactor, Miner. Eng., 23, 578–586 (2010).

M. Zhang, J.J. Lv, F.F. Li, N. Bao, A.J. Wang, J.J. Feng, D.L. Zhou, Urea assisted electrochemical synthesis of flower-like platinum arrays with high electrocatalytic activity, Electrochim. Acta, 123, 227–232 (2014).

S. Survilienė, V. Jasulaitienė, A. Češūnienė, A. Lisowska-Oleksiak, The use of XPS for study of the surface layers of Cr–Co alloy electrodeposited from Cr(III) formate–urea baths, Solid State Ionics, 179, 222–227 (2008).

L. Bonou, M. Eyraud, R. Denoyel, Y. Massiani, Influence of additives on Cu electrodeposition mechanisms in acid solution: direct current study supported by non-electrochemical measurements, Electrochim. Acta, 47, 4139–4148 (2002).

K. Boto, Electrodep. Surf. Treat., Organic additives in zinc electroplating, 3, 77–95 (1975).

R.N. Emerson, C.J. Kennady, S. Ganesan, Effect of organic additives on the magnetic properties of electrodeposited CoNiP hard magnetic films, Thin Solid Films, 515, 3391–3396, (2007).

A. Rane, K. Bhatki, Electrodeposition of carrier-free manganese-54, technetium-99 and actinium-288 from aqueous baths, Int. J. Appl. Radiat. Is., 24, 385–389 (1973).

G. Li, Q. Ke, G. Liu, Y. Tong, Studies on the electrochemical preparation of MgCeCo alloy thin films on Cu substrates in urea–DMSO system, Mater. Lett., 60, 2611–2616 (2006).

M. Harati, D. Love, W. Lau, Z. Ding, Preparation of crystalline zinc oxide films by one-step electrodeposition in Reline, Mater. Lett., 89, 339–342 (2012).

T. Tsuda, T. Tomioka, C. Hussey, Physicochemical properties of highly conductive urea–EtMeImCl melts, Chem. Commun., 25, 2908–2910 (2008).

S.L. Wang, J.B. Lin, Q.Y. Cai, Y. Zhang, Electrodeposition of Co–La alloy films in urea melt and their performances, J. Alloy. Comp., 450, 142–147 (2008).

M. Bučko, J. Rogan, B. Jokić, M. Mitrić, U. Lačnjevac, J. B. Bajat, Electrodeposition of Zn–Mn alloys at high current densities from chloride electrolyte, J. Solid State Electrochem., 17, 1409–1419 (2013).

M. G. Pavlović, Lj. J. Pavlović, Morphology and structure of bright electrodeposited metal coatings, Maced. J. Chem. Eng., 30, 29–43 (2011).

O.B. Ibrahim, Complexes of urea with Mn(II), Fe(III), Co(II), and Cu(II) metal ions, Advances in Applied Science Research, 3, 3522–3539 (2012).

S. Surviliene, O. Nivinskiene, A. Cesuniene, A. Selskis, Effect of Cr(III) solution chemistry on electrodeposition of chromium, J. Appl. Electrochem., 36, 649–654 (2006).

Y.B. Song, D.T. Chin, Current efficiency and polarization behavior of trivalent chromium

electrodeposition process, Electrochim. Acta, 48, 349–356 (2002).

X. Hoccart, G. Turrell, A Raman spectroscopic investigation of the dynamics of urea-water complexes, J. Chem. Phys., 99, 8498–8503 (1993).

J. Gong, G. Zangari, Electrodeposition and characterization of manganese coatings, J. Electrochem. Soc., 149, C209–C217 (2002).

N. D. Nikolić, G. Branković, M. G. Pavlović, Effect of the electrolysis regime on the structural characteristics of honeycomb-like electrodes, Maced. J. Chem. Eng., 32, 79–87 (2013).

J. Gong, G. Zangari, Electrodeposition of sacrificial tin–manganese alloy coatings, Mat. Sci. Eng. A, 344, 268–278 (2003).

B. Bozzini, E. Griskonis, A. Fanigliulo, A. Sulcius, Electrodeposition of Zn–Mn alloys in the presence of thiocarbamide, Surf. Coat. Technol., 154, 294–303 (2002).



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